As the unstoppable progression of Moore’s law has driven the semiconductor technology roadmap farther and farther below 1 µm, a steady stream of engineering marvels has been required to produce ...

Given that my last couple of blogs on double patterning (DP) might have scared you to death, I figured it was time to bring you some good news. It is unavoidably true that double patterning layout ...

SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...

Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...

To extend 193-nm lithography to next-generation semiconductors, Round Rock, Texas-based photomask provider Toppan Photomasks Inc. and Grenoble, France-based technology R&D organization Electronics and ...