A University of Maryland professor has a radical approach to the problem of nanometer IC variability: Put it off. By combining design optimizations with postsilicon fixes, IC yield loss can be avoided ...
A “best paper” award winner at the International Symposium on Physical Design (ISPD 2007) proposes a new approach to nanometer IC variability challenges — combining design optimizations with ...
Grenoble, France – September 23, 2008 – Infiniscale - the leading provider of behavioral modeling, model-based sizing and parametric yield solutions dedicated to Analog Systems – and Mentor ...
Manual and automated IC-layout tools are integrated in the PEYE Yield Finder analysis software. The combined yield-driven, standard-cell, design optimization flow facilitates the application of design ...
To ensure success in semiconductor technology development, process engineers must set the allowed ranges for wafer process parameters. Variability must be controlled, so that final fabricated devices ...
There is no single solution, but there plenty of room for improvement—and lots of investment around better use of data. Equipment and tools vendors are starting to focus on data as a means of ...
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