A powerful method co-invented/developed in the lab is to use atomic layer deposition (ALD) to deposit nearly perfect ultrathin nano-thick films at angstrom level precision onto primary particles, i.e.

Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

Modern imaging systems, such as those used in smartphones, virtual reality (VR), and augmented reality (AR) devices, are ...

"The device structure ... represents the most simplified architecture in the current field of perovskite solar cells." ...

The global atomic layer deposition (ALD) equipment market is poised for robust growth over the next decade, driven by increasing demand for advanced semiconductor and photonic devices. Estimated at ...

Read why ASM is a leader in atomic layer deposition equipment for advancing transistor structures, making the stock a buy at ...

the FlexAL atomic layer deposition (ALD) system provides a wide range of optimized high-quality plasma ALD and thermal ALD procedures. The ALD product line includes a variety of instruments to satisfy ...

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Researchers in Spain have developed an n-type crystalline silicon solar cell based on vanadium oxide films deposited by atomic layer deposition. The cell showed an open-circuit voltage of 631 mV ...

Oxford Instruments (LON:OXIG – Free Report) had its target price decreased by Berenberg Bank from GBX 2,925 ($36.86) to GBX 2 ...

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...